Process Introduction & Product Specifications
Specification Photolithography Laser Engraving
Feature Leading Technology with Patent. Single layer multi-color GOBO with 1.1 mm thickness.Sharpness and bright color High precision Laser Engraving. Flexible production for small diameter and batch.
Production Process Ion Assisted Deposition
Material Borosilicate Glass
Size & Diameter ø22.5mm、ø27.5mm、ø37.5mm
Thickness Mono/multicolor 1.土0.1mm Mono 1土0.1mm / multi color 4.4土0.4mm
Heat Resistance 300°c, 4~6H
Specification Photolithography Laser Engraving
Line Width(mm) 0.05 0.07~0.1
Line Distance(mm) 0.14 0.15~0.2
Minimum Diameter of circle(mm) 0.05 0.2~0.25
Distance of the center of circle(mm) 0.14 0.15-0.2
Mini font size(Pt) 1 3
Remark File/picture resolution: 300X300dpi above. Requirement may differ from material.
Color Gauge Spectrum
Spectrum
Spectrum

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